OSAKA, Japan — Mitsubishi Electric Corp. has developed a single-step, hydrofluoric acid electrochemical etching process that can achieve an aspect ratio greater than 60:1 at potentially a tenth of the ...
The engineer decides to make a virtual twin (process model) of the etch process to mimic the actual behavior of the wafer ...
With photolithography not able to produce circuit lines much thinner than 100nm, a major focus of research into nanotechnology is in developing means to construct circuits that break the 100nm barrier ...
LEDs, or light-emitting diodes, are essential components in near-eye displays like virtual reality and augmented reality ...
A standard 13.56 MHz driven parallel plate reactive ion etcher (Trion Technology Minilock II), which allows internal anodization for use with chlorine was utilized for this experiment. Some features ...
Photochemical etching is a machining technique that leverages the principles behind photography to shape a piece of sheet metal and turn it into a finished product or component. The modern form of ...
A team of physicists has uncovered some of the physics that make possible the etching of silicon computer chips, which power cell phones, computers, and a huge range of electronic devices. Physicist ...
A new approach combining atomic layer deposition and organic film etch process may solve critical challenges in the various processes in advanced nodes. We demonstrated a high selective and ...
Ion beam expertise is critical to delivering the manufacturing tolerance required for these gratings. Oxford Instruments Plasma Technology has developed a technology to allow optical designers to ...
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